Swerts, JohanJohanSwertsDelabie, AnneliesAnneliesDelabieSalimullah M. M., SalimullahSalimullahSalimullah M. M.Popovici, Mihaela IoanaMihaela IoanaPopoviciKim, Min-SooMin-SooKimSchaekers, MarcMarcSchaekersVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-2020122162-8726https://imec-publications.be/handle/20.500.12860/21575Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer depositionJournal article