Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Beynet, JulienJulienBeynetWong, PatrickPatrickWongMiller, AndyAndyMillerLocorotondo, SabrinaSabrinaLocorotondoVangoidsenhoven, DizianaDizianaVangoidsenhovenYoon, Tae-HoTae-HoYoonDemand, MarcMarcDemandPark, Hyung-SangHyung-SangParkVandeweyer, TomTomVandeweyerSprey, HesselHesselSpreyYoo, Yong-MinYong-MinYooMaenhoudt, MireilleMireilleMaenhoudt2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/14998Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)Proceedings paper