Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

Gunay Demirkol, AnilAnilGunay DemirkolAltamirano Sanchez, EfrainEfrainAltamirano SanchezHéraud, StéphaneStéphaneHéraudGodny, StephaneStephaneGodnyCharley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLerayUrenski, RonenRonenUrenskiCohen, OdedOdedCohenTurovets, IgorIgorTurovetsWolfling, ShayShayWolfling2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26673Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process controlProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507368