Atomic layer deposition of HfO2 on (100) and (110) oriented silicon surfaces

Nyns, LauraLauraNynsRagnarsson, Lars-AkeLars-AkeRagnarssonHall, LindseyLindseyHallDelabie, AnneliesAnneliesDelabieHeyns, MarcMarcHeynsVan Elshocht, SvenSvenVan ElshochtVinckier, ChrisChrisVinckierZimmerman, PaulPaulZimmermanDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12629Atomic layer deposition of HfO2 on (100) and (110) oriented silicon surfacesProceedings paper