Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS

Conard, ThierryThierryConardDe Witte, HildeHildeDe WitteVandervorst, WilfriedWilfriedVandervorstHoussa, MichelMichelHoussaHeyns, MarcMarcHeynsPomarede, C.C.PomaredeWerkhoven, ChrisChrisWerkhoven2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3312Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMSOral presentation