Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics

Ronse, KurtKurtRonsePforr, RainerRainerPforrBaik, Ki-HoKi-HoBaikJonckheere, RikRikJonckheereVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/318Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logicsProceedings paper