Ion channeling strain measurements of uniaxially strained Si/SiGe heterostructures on Si(110) and Si(110)

Hollaender, BerndBerndHollaenderMinamisawa, R.R.MinamisawaBuca, DanDanBucaTrinkaus, HHTrinkausMantl, SiegfriedSiegfriedMantlLoo, RogerRogerLooHartmann, Jean-MichelJean-MichelHartmann2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17272Ion channeling strain measurements of uniaxially strained Si/SiGe heterostructures on Si(110) and Si(110)Meeting abstract