Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices

Schram, TomTomSchramSpessot, AlessioAlessioSpessotRitzenthaler, RomainRomainRitzenthalerRosseel, ErikErikRosseelCaillat, ChristianChristianCaillatHoriguchi, NaotoNaotoHoriguchi2021-10-222021-10-2220140167-9317https://imec-publications.be/handle/20.500.12860/24498Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devicesJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931713007004