The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers

Lee, Hean-ChealHean-ChealLeeVanhaelemeersch, SergeSergeVanhaelemeersch2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2715The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layersJournal article