Electrochemical and analytical study of the Si etching mechanism in HF

Valckx, NickNickValckxVos, RitaRitaVosRip, JensJensRipDoumen, GeertGeertDoumenMertens, PaulPaulMertensBearda, TwanTwanBeardaHeyns, MarcMarcHeynsDe Gendt, StefanStefanDe Gendt2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16341Electrochemical and analytical study of the Si etching mechanism in HFMeeting abstract