Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma

de Marneffe, Jean-FrancoisJean-Francoisde MarneffeGoossens, DannyDannyGoossensShamiryan, DenisDenisShamiryanLazzarino, FredericFredericLazzarinoStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13605Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasmaMeeting abstracthttp://absimage.aps.org/image/MWS_GEC08-2008-000177.pdf