Comparative study of rapid and classical thermal phosphorous diffusion on polycrystalline silicon thin films

Bourdais, S.S.BourdaisBeaucarne, GuyGuyBeaucarneSlaoui, A.A.SlaouiPoortmans, JefJefPoortmansSemmache, B.B.SemmacheDubois, C.C.Dubois2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5095Comparative study of rapid and classical thermal phosphorous diffusion on polycrystalline silicon thin filmsJournal article