Integration of dual work function CMOS using doped high-K dielectric and metal gates to achieve improved power-performance

Biesemans, SergeSergeBiesemans2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13393Integration of dual work function CMOS using doped high-K dielectric and metal gates to achieve improved power-performanceOral presentation