Advances and challenges in ultra low-k patterning

Xu, KaidongKaidongXuSouriau, LaurentLaurentSouriauLazzarino, FredericFredericLazzarinode Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullart2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21869Advances and challenges in ultra low-k patterningMeeting abstract