Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics

Baklanov, MikhaïlMikhaïlBaklanovde Marneffe, Jean-FrancoisJean-Francoisde MarneffeZhang, LipingLipingZhangCiofi, IvanIvanCiofiTokei, ZsoltZsoltTokei2021-10-222021-10-2220140038-111Xhttps://imec-publications.be/handle/20.500.12860/23516Cryogenic etching reduces plasma-induced damage of ultralow-k dielectricsJournal articlehttp://electroiq.com/issue/?id=27550&url=/articles/sst/print/volume-5/issue-57/features/etching/cryogenic-etching-reduces-plasma