Dynamics of electromigration induced void-hillock growth and precipitation/dissolution of addition elements studied by in-situ electron microscopy resistance measurements

D'Haen, JanJanD'HaenCosemans, P.P.CosemansManca, JeanJeanMancaLekens, GeertGeertLekensMartens, T.T.MartensDe Ceuninck, WardWardDe CeuninckD'Olieslaeger, MarcMarcD'OlieslaegerDe Schepper, LucLucDe SchepperMaex, KarenKarenMaex2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3420Dynamics of electromigration induced void-hillock growth and precipitation/dissolution of addition elements studied by in-situ electron microscopy resistance measurementsJournal article