Severi, JorenJorenSeveriLorusso, Gian F.Gian F.LorussoDe Simone, DaniloDaniloDe SimoneMoussa, AlainAlainMoussaSaib, MohamedMohamedSaibDuflou, RutgerRutgerDuflouDe Gendt, StefanStefanDe Gendt2023-02-232022-08-122023-02-2320221932-5150WOS:000835428700009https://imec-publications.be/handle/20.500.12860/40253Chemically amplified resist CDSEM metrology exploration for high NA EUV lithographyJournal article10.1117/1.JMM.21.2.021207WOS:000835428700009