Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions

Van Dongen, KaatKaatVan DongenNye, RachelRachelNyeClerix, Jan-WillemJan-WillemClerixSixt, ClaudiaClaudiaSixtDe Simone, DaniloDaniloDe SimoneDelabie, AnneliesAnneliesDelabie2023-06-302023-04-062023-06-3020230734-2101WOS:000952702300001https://imec-publications.be/handle/20.500.12860/41429Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactionsJournal article10.1116/6.0002347WOS:000952702300001ATOMIC LAYER DEPOSITIONMETAL-OXIDESGROWTHSIO2HEXAMETHYLDISILAZANEELECTRONEGATIVITYPASSIVATIONNUCLEATIONRUTHENIUMMECHANISM