Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer

de Marneffe, Jean-FrancoisJean-Francoisde MarneffeChan, BTBTChanSpieser, MartinMartinSpieserVereecke, GuyGuyVereeckeNaumov, SergejSergejNaumovVanhaeren, DanielleDanielleVanhaerenKnoll, ArminArminKnollWolf, HeikoHeikoWolf2021-10-252021-10-2520181936-0851https://imec-publications.be/handle/20.500.12860/30533Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transferJournal articlehttps://pubs.acs.org/doi/10.1021/acsnano.8b05596