Economical shallow emitter formation by plasma immersion ion implantation and RTA process

Pinter, IstvanIstvanPinterDusco, C.C.DuscoKhanh, N. Q.N. Q.KhanhAdam, M.M.AdamMakaro, Z.Z.MakaroBarsony, I.I.BarsonySivoththaman, SivanarayanamoorthySivanarayanamoorthySivoththamanPoortmans, JefJefPoortmansAdriaenssens, G.G.Adriaenssens2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2868Economical shallow emitter formation by plasma immersion ion implantation and RTA processProceedings paper