Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability

Ortolland, ClaudeClaudeOrtollandNoda, TaijiTaijiNodaChiarella, ThomasThomasChiarellaKubicek, StefanStefanKubicekKerner, ChristophChristophKernerVandervorst, WilfriedWilfriedVandervorstOpdebeeck, AnnAnnOpdebeeckVrancken, ChristaChristaVranckenHoriguchi, NaotoNaotoHoriguchide Potter de ten Broeck, MurielMurielde Potter de ten BroeckAoulaiche, MarcMarcAoulaicheRosseel, ErikErikRosseelFelch, S.B.S.B.FelchAbsil, PhilippePhilippeAbsilSchreutelkamp, RobRobSchreutelkampBiesemans, SergeSergeBiesemansHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14256Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturabilityProceedings paper