Sequential infiltration synthesis for line edge roughness mitigation of EUV resist

Baryshnikova, MarinaMarinaBaryshnikovaDe Simone, DaniloDaniloDe SimoneKnaepen, WernerWernerKnaepenKachel, KrzysztofKrzysztofKachelChan, BTBTChanPaolillo, SaraSaraPaolilloMaes, JanJanMaesDe Roest, DavidDavidDe RoestRincon Delgadillo, PaulinaPaulinaRincon DelgadilloVandenberghe, GeertGeertVandenberghe2021-10-242021-10-2420170914-9244https://imec-publications.be/handle/20.500.12860/27807Sequential infiltration synthesis for line edge roughness mitigation of EUV resistJournal articlehttps://www.jstage.jst.go.jp/article/photopolymer/30/6/30_667/_pdf