XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

Conard, ThierryThierryConardDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanovVos, RitaRitaVosHeyns, MarcMarcHeynsVandervorst, WilfriedWilfriedVandervorst2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3310XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicidesProceedings paper