Le, Quoc ToanQuoc ToanLeDrieskens, FrederikFrederikDrieskensConard, ThierryThierryConardLux, MarcelMarcelLuxde Marneffe, Jean-FrancoisJean-Francoisde MarneffeStruyf, HerbertHerbertStruyfVereecke, GuyGuyVereecke2021-10-202021-10-2020121662-9779https://imec-publications.be/handle/20.500.12860/20991Modification of post-etch residues by UV for wet removalJournal article