Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system

Teugels, LieveLieveTeugelsDevriendt, KatiaKatiaDevriendtHeylen, NancyNancyHeylenTsvetanova, DianaDianaTsvetanovaStruyf, HerbertHerbertStruyfBast, GerhardGerhardBastRamkhalawon, RoshitaRoshitaRamkhalawonMueller, DieterDieterMuellerSimpson, GavinGavinSimpsonUlea, NeliNeliUlea2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27387Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry systemOral presentation