Characterisation of plasma etch related residues formed on top of ECD Cu

Baklanov, MikhaïlMikhaïlBaklanovConard, ThierryThierryConardLanckmans, FilipFilipLanckmansVanhaelemeersch, SergeSergeVanhaelemeerschHolmes, D.D.HolmesMaex, KarenKarenMaex2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3206Characterisation of plasma etch related residues formed on top of ECD CuOral presentation