Materials and electrical characterization of metal gate electrodes on high-k dielectrics for advanced CMOS technologies

Hooker, JacobJacobHookerLander, RobRobLanderRittersma, ChrisChrisRittersmaSchram, TomTomSchramLujan, GuilhermeGuilhermeLujanvan Zijl, JeroenJeroenvan Zijlvan den Heuvel, EricEricvan den HeuvelRoozeboom, FredFredRoozeboom2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6404Materials and electrical characterization of metal gate electrodes on high-k dielectrics for advanced CMOS technologiesProceedings paper