Pollentier, IvanIvanPollentierErcken, MoniqueMoniqueErckenFoubert, PhilippePhilippeFoubertCheng, ShauneeShauneeCheng2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11032Resist profile control in immersion lithography using scatterometry measurementsProceedings paper