Verhaverbeke, StevenStevenVerhaverbekeTeerlinck, IvoIvoTeerlinckVinckier, ChrisChrisVinckierStevens, G.G.StevensCartuyvels, RudiRudiCartuyvelsHeyns, MarcMarcHeyns2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/439The etching mechanisms of SiO2 in hydrofluoric acidJournal article