Wet removal of post-etch residues by a combination of UV irradiation and a SC1 process

Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeSimms, IhsanIhsanSimmsNafus, KathleenKathleenNafusStruyf, HerbertHerbertStruyfDe Gendt, StefanStefanDe Gendt2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22579Wet removal of post-etch residues by a combination of UV irradiation and a SC1 processProceedings paper