Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer

Sano, K.K.SanoIzumi, A.A.IzumiEitoku, A.A.EitokuSnow, J.J.SnowNyns, LauraLauraNynsKubicek, StefanStefanKubicekSinganamalla, RaghunathRaghunathSinganamallaRichard, OlivierOlivierRichardConard, ThierryThierryConardVos, RitaRitaVosMertens, PaulPaulMertens2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14419Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm waferProceedings paper