In-line plasma surface etching and PECVD SiNX:H deposition for crystalline Si solar cell processing

De Wolf, StefaanStefaanDe WolfSchade, K.K.SchadeDekkers, HaroldHaroldDekkersBeaucarne, GuyGuyBeaucarne2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10341In-line plasma surface etching and PECVD SiNX:H deposition for crystalline Si solar cell processingProceedings paper