(TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefacts

Conard, ThierryThierryConardHuyghebaert, CedricCedricHuyghebaertVandervorst, WilfriedWilfriedVandervorst2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7341(TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefactsMeeting abstract