High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory Applications

Kundu, ShreyaShreyaKunduGarbin, DanieleDanieleGarbinDevulder, WouterWouterDevulderDonadio, Gabriele LucaGabriele LucaDonadioLazzarino, FredericFredericLazzarino2023-08-242023-07-202023-08-2420232574-0970WOS:001010275800001https://imec-publications.be/handle/20.500.12860/42179High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory ApplicationsJournal article10.1021/acsanm.3c01611WOS:001010275800001ETCHING CHARACTERISTICSTHIN-FILMS