Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In,Ga)Se-2 Thin Films: An Innovative Al2O3/HfO2 Multistack Design

Scaffidi, RomainRomainScaffidiBuldu, Dilara GokcenDilara GokcenBulduBrammertz, GuyGuyBrammertzde Wild, JessicaJessicade WildKohl, ThierryThierryKohlBirant, GizemGizemBirantMeuris, MarcMarcMeurisPoortmans, JefJefPoortmansFlandre, DenisDenisFlandreVermang, BartBartVermang2022-03-042021-11-022022-03-0420211862-6300WOS:000658279200001https://imec-publications.be/handle/20.500.12860/37895Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In,Ga)Se-2 Thin Films: An Innovative Al2O3/HfO2 Multistack DesignJournal article10.1002/pssa.202100073WOS:000658279200001SOLAR-CELLSINTERFACE PASSIVATIONLAYERIMPACT