Kittl, JorgeJorgeKittlLauwers, AnneAnneLauwersDemeurisse, CarolineCarolineDemeurisseVrancken, ChristaChristaVranckenKubicek, StefanStefanKubicekAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemans2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12403Direct evidence of linewidth effect: Ni31Si12 and Ni3Si formation on 25 nm Ni fully silicided gatesJournal article