Hofmann, U.U.HofmannKalus, C.C.KalusRosenbusch, A.A.RosenbuschJonckheere, RikRikJonckheereHourd, A.A.Hourd2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1261Hierarchical E-beam proximity correction in mask makingProceedings paper