Contribution of mask roughness in stochasticity of high-NA EUV imaging

Jonckheere, RikRikJonckheereMelvin, Lawrence, IIILawrence, IIIMelvin2022-06-282022-05-222022-06-032022-06-282021-11978-1-5106-4552-30277-786XWOS:000792657300009https://imec-publications.be/handle/20.500.12860/39871Contribution of mask roughness in stochasticity of high-NA EUV imagingProceedings paper10.1117/12.2601897978-1-5106-4553-0WOS:000792657300009