Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch

Chan, BTBTChanBoemmels, JuergenJuergenBoemmelsRyckaert, JulienJulienRyckaertZhang, LipingLipingZhangTao, ZhengZhengTaoAltamirano Sanchez, EfrainEfrainAltamirano Sanchezde Marneffe, Jean-FrancoisJean-Francoisde Marneffe2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32683Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitchOral presentation