EUV lithography qualification: Comparison of alternative wafer inspection methodologies and sensitivities

Halder, SandipSandipHalderLeray, PhilippePhilippeLeray2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30839EUV lithography qualification: Comparison of alternative wafer inspection methodologies and sensitivitiesOral presentationhttps://www.spie.org/AL18/conferencedetails/metrology-inspection-process-control-microlithography?SSO=1