Cleaning aspects of novel materials after CMP

Vos, RitaRitaVosWada, M.M.WadaArnauts, SophiaSophiaArnautsTakahashi, H.H.TakahashiCuypers, DanielDanielCuypersStruyf, HerbertHerbertStruyfMertens, PaulPaulMertens2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20119Cleaning aspects of novel materials after CMPProceedings paper