Wu, MeiyiMeiyiWuThakare, DeveshDeveshThakareDe Marneffe, Jean-FrancoisJean-FrancoisDe MarneffeJaenen, PatrickPatrickJaenenSouriau, LaurentLaurentSouriauOpsomer, KarlKarlOpsomerSoulie, Jean-PhilippeJean-PhilippeSoulieErdmann, AndreasAndreasErdmannMesilhy, HazemHazemMesilhyNaujok, PhilippPhilippNaujokFoltin, MarkusMarkusFoltinSoltwisch, VictorVictorSoltwischSaadeh, QaisQaisSaadehPhilipsen, VickyVickyPhilipsen2022-01-182021-11-022022-01-1820200277-786XWOS:000632585900001https://imec-publications.be/handle/20.500.12860/38081Mask absorber for next generation EUV lithographyProceedings paper10.1117/12.2572114978-1-5106-3843-3WOS:000632585900001