Area selective atomic layer deposition: a bottom-up approach for patterning

Delabie, AnneliesAnneliesDelabieSoethoudt, JobJobSoethoudtTomczak, YoannYoannTomczakBriggs, BasoeneBasoeneBriggsChan, BTBTChanTokei, ZsoltZsoltTokeiVan Elshocht, SvenSvenVan ElshochtAltamirano Sanchez, EfrainEfrainAltamirano SanchezStevens, EricEricStevensParsons, Gregory, NGregory, NParsons2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30586Area selective atomic layer deposition: a bottom-up approach for patterningMeeting abstracthttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf