Optimisation of PECVD poly-SiGe layers for MEMS post-processing on top of CMOS

Mehta, AnshuAnshuMehtaGromova, MariaMariaGromovaCzarnecki, PiotrPiotrCzarneckiBaert, KrisKrisBaertWitvrouw, AnnAnnWitvrouw2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10873Optimisation of PECVD poly-SiGe layers for MEMS post-processing on top of CMOSProceedings paper