Rathsack, BenBenRathsackHooge, JoshuaJoshuaHoogeScheer, StevenStevenScheerNafus, KathleenKathleenNafusHatakeyama, ShinichiShinichiHatakeyamaKouichi, HontakeHontakeKouichiKitano, JunichiJunichiKitanoVan Den Heuvel, DieterDieterVan Den HeuvelLeray, PhilippePhilippeLerayHendrickx, EricEricHendrickxFoubert, PhilippePhilippeFoubertGronheid, RoelRoelGronheid2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14362Image contrast contributions to immersion lithography defect formation and process yieldProceedings paper