Kikuchi, YoshiakiYoshiakiKikuchiHopf, TobyTobyHopfMannaert, GeertGeertMannaertTao, ZhengZhengTaoWaite, A.A.WaiteCournoyer, J.J.CournoyerBorniquel, J.J.BorniquelSchreutelkamp, RobRobSchreutelkampRitzenthaler, RomainRomainRitzenthalerKim, Min-SooMin-SooKimKubicek, StefanStefanKubicekChew, Soon AikSoon AikChewDevriendt, KatiaKatiaDevriendtSchram, TomTomSchramDemuynck, StevenStevenDemuynckVariam, N.N.VariamHoriguchi, NaotoNaotoHoriguchiMocuta, DanDanMocuta2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26830Improvement of the CMOS characteristics of bulk Si FinFETs by high temperature ion implantationMeeting abstract