HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity

Paraschiv, VasileVasileParaschivClaes, MartineMartineClaesBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullartDe Gendt, StefanStefanDe GendtVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10983HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivityProceedings paper