Holistic patterning technology for DRAM 29nm pitch contact hole and pillar patterning

Park, SeunghakSeunghakParkPham, Van TuongVan TuongPhamYun, SanghoSanghoYunJung, WoojinWoojinJungSuh, Hyo SeonHyo SeonSuhVerstraete, LanderLanderVerstraeteBae, Hyung JongHyung JongBaePark, TaehoiTaehoiParkBlanco, VictorVictorBlancoHeo, SeonggilSeonggilHeoRonse, KurtKurtRonseHwang, ChanChanHwang2025-06-172025-05-112025-06-172024978-1-5106-8155-20277-786XWOS:001467876500022https://imec-publications.be/handle/20.500.12860/45640Holistic patterning technology for DRAM 29nm pitch contact hole and pillar patterningProceedings paper10.1117/12.3034701978-1-5106-8156-9WOS:001467876500022