In situ phosphorus-doped polycrystalline silicon films by low pressure chemical vapor deposition for contact passivation of silicon solar cells

Firat, MericMericFiratPayo, Maria RecamanMaria RecamanPayoDuerinckx, FilipFilipDuerinckxTous, LoicLoicTousPoortmans, JefJefPoortmansSivaramakrishnan Radhakrishnan, HariharsudanHariharsudanSivaramakrishnan Radhakrishnan2022-03-232022-02-152022-03-232022-01-010038-092XWOS:000744236400008https://imec-publications.be/handle/20.500.12860/38860In situ phosphorus-doped polycrystalline silicon films by low pressure chemical vapor deposition for contact passivation of silicon solar cellsJournal article10.1016/j.solener.2021.11.045WOS:000744236400008Energy & fuelsphotovoltaicspassivating contacts