300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns

Clerix, Jan-WillemJan-WillemClerixDelabie, AnneliesAnneliesDelabieHung, JoeyJoeyHungWarad, L.L.WaradShah, KavitaKavitaShah2021-10-282021-10-282020https://imec-publications.be/handle/20.500.12860/34916300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patternsMeeting abstracthttps://www.avssymposium.org/ALD2020/Meetings/Schedule